Technology Magazine January 2026 | Page 227

DATA & ANALYTICS
Hans emphasises this critical need:“ As the industry evolves, there is an urgent need for new, high-purity chemical formulations, an area where Fujifilm is well-positioned to respond.”
A comprehensive materials solution What distinguishes Fujifilm in the semiconductor materials market is its breadth of offering. Rather than specialising in a single aspect of chip production, the company provides solutions across the entire manufacturing process, from initial wafer processing through to final post-processing steps. This comprehensive approach allows semiconductor manufacturers to work with a single trusted partner throughout their production cycle, streamlining supply chains and ensuring consistent quality across all material inputs.
Hans outlines this strategic advantage:“ Fujifilm Electronic Materials differentiates itself by offering a comprehensive one-stop solution with a diverse product range, including photoresists, photolithography-related materials, CMP slurries, post-CMP cleaners, thin-film chemicals, polyimides and high-purity process chemicals. Our WAVE CONTROL MOSAIC line includes colour filter materials designed for image sensors.”
This comprehensive approach extends to supply chain strategy as well. Fujifilm operates on a principle of local production for local consumption, investing heavily in facilities across Europe – including Belgium, France, Italy and the UK – to support regional

“ We are striving to be the TSMC of the biopharmaceutical industry, with trust as the foundation”

John Stewart, SVP Global Process Development, Fujifilm Biotechnologies
semiconductor manufacturers while minimising environmental impact. This localised approach not only reduces the carbon footprint associated with global shipping but also provides customers with responsive, proximate technical support and ensures supply chain resilience in an increasingly uncertain geopolitical landscape.
Pushing the boundaries with EUV One of the most significant technical challenges in semiconductor manufacturing involves extreme ultraviolet( EUV) lithography – essential for creating the smallest circuit patterns on chips. EUV technology uses light with wavelengths of just 13.5 nanometres – much shorter than the deep ultraviolet light used in previous generations – enabling the production of features measuring just a few nanometres across. However, working at such scales presents extraordinary materials challenges, requiring photoresists and developers with unprecedented performance characteristics.
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