DATA & ANALYTICS
Fujifilm has pioneered innovations in this space, developing the first negative tone imaging( NTI) process for semiconductor miniaturisation and subsequently enhancing it with negative-tone EUV resist and compatible developers.
Hans explains:“ EUV technology is essential for scaling down device dimensions in semiconductors. We are further enhancing this process by providing negative-tone EUV resist and a compatible EUV developer, allowing for advanced circuit pattern formation.”
The company’ s innovation extends to other critical manufacturing steps as well. As semiconductor devices incorporate increasing numbers of layers – sometimes exceeding 100 individual layers in advanced memory chips – chemical mechanical planarisation( CMP), a process for smoothing surfaces between layers, becomes more critical.
Hans says:“ The growth in the semiconductor industry, coupled with an increasing number of device layers, has led to more chemical mechanical planarisation( CMP) steps being performed. Consequently, the demand for effective post-CMP cleaning solutions has risen significantly. Fujifilm is at the forefront of this trend, developing innovative cleaning solutions that enhance the efficiency and efficacy of post-CMP processes.”
228 January 2026